The UNECS-Series of Spectroscopic Ellipsometers by ULVAC includes different configurations, ranging from manual and portable instruments to motorized units and integratable sensors. Two different wavelength-ranges can be selected, either 530 nm – 750 nm or 380 nm – 760 nm.
All instruments operate at an unmatched high measurement speed by using the ‘snapshot’ method resulting in an acquisition time of only 20 ms per measurement spot. This allows for instance the mapping of an entire wafer of up to 300 mm in short time.
This technique is highly precise with a repeatability of the thickness-measurements as low as 0.1 nm.
Ease of use and a maintenance-free hardware are only two of the benefits of the instruments. The software comes with a huge database of predefined materials which allows for the analysis of complex layer stacks in the range of 1 nm to 2 micron. The database can be edited and expanded by adding material data which is not included.
ULVAC Spectroscopic Ellipsometers are ideally suited for the analysis of transparent or semi-transparent layers (oxides, nitrides, photoresists, ITO, etc). The thickness, the refractive index, and the extinction-coefficient of each layer of a stack can be measured.